The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Jan. 04, 2006
Theodorus Marinus Modderman, Nuenen, NL;
Gerrit Johannes Nijmeijer, Eindhoven, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
Theodorus Marinus Modderman, Nuenen, NL;
Gerrit Johannes Nijmeijer, Eindhoven, NL;
Johannes Christiaan Maria Jasper, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.