The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Aug. 10, 2005
Janos Fucsko, Boise, ID (US);
Grady S. Waldo, Boise, ID (US);
Kevin J. Torek, Meridian, ID (US);
LI LI, Meridian, ID (US);
Janos Fucsko, Boise, ID (US);
Grady S. Waldo, Boise, ID (US);
Kevin J. Torek, Meridian, ID (US);
Li Li, Meridian, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A method of etching silicon nitride substantially selectively relative to an oxide of aluminum includes providing a substrate comprising silicon nitride and an oxide of aluminum. The silicon nitride and the oxide is exposed to an etching solution comprising HF and an organic HF solvent under conditions effective to etch the silicon nitride substantially selectively relative to the oxide. Other aspects and implementations are contemplated.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile