The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Jan. 14, 2005
Hsin-huang Hsieh, Hsinchu, TW;
Chien-ping Chang, Hsinchu, TW;
Mao-song Tseng, Hsinchu, TW;
Tien-min Yuan, Hsinchu, TW;
Hsin-Huang Hsieh, Hsinchu, TW;
Chien-Ping Chang, Hsinchu, TW;
Mao-Song Tseng, Hsinchu, TW;
Tien-Min Yuan, Hsinchu, TW;
Mosel Vitelic, Inc., Hsinchu, TW;
Abstract
The present invention provides a manufacturing process and the structure of an integrated circuit. In one embodiment, one polysilicon layer deposition and one polysilicon layer etching are used to form the gate of a trench device and the polysilicon layer of a planar device simultaneously. The present invention not only has overcome the problem of the electric leakage, but also has the advantages of withstanding a higher voltage, reducing the relevant cost and increasing the yields. The present invention possesses the outstanding technical features in the field of the power device.