The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2007

Filed:

Dec. 07, 2004
Applicants:

Christoph Kleint, Dresden, DE;

Christoph Ludwig, Langebruck, DE;

Josef Willer, Riemerling, DE;

Joachim Deppe, Dresden, DE;

Inventors:

Christoph Kleint, Dresden, DE;

Christoph Ludwig, Langebruck, DE;

Josef Willer, Riemerling, DE;

Joachim Deppe, Dresden, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electrically conductive bit line layer is applied and patterned into portions arranged parallel to one another before the trench is etched into the semiconductor material, in which case, after the patterning of the bit line layer () and before the etching of the trench, an implantation is introduced for the purpose of defining the position of the junctions, or, after the implantation of the n-type well () for the source/drain regions, the bit line layer () is patterned using an etching stop layer () arranged on the semiconductor body ().


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