The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2007

Filed:

Nov. 17, 2005
Applicants:

Sung Hen Cho, Seoul, KR;

Euk Che Hwang, Osan-si, KR;

Jin Young Kim, Suwon-si, KR;

Chang Ho Noh, Suwon-si, KR;

Ki Yong Song, Seoul, KR;

Ho Chul Lee, Suwon-si, KR;

Inventors:

Sung Hen Cho, Seoul, KR;

Euk Che Hwang, Osan-si, KR;

Jin Young Kim, Suwon-si, KR;

Chang Ho Noh, Suwon-si, KR;

Ki Yong Song, Seoul, KR;

Ho Chul Lee, Suwon-si, KR;

Assignee:

Samsung Corning Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for manufacturing a high-transmittance optical filter for image display devices, which may include the steps of coating a photocatalytic compound on a transparent substrate to form a photocatalytic film, selectively exposing the photocatalytic film to light and growing a metal crystal thereon by plating to form a metal pattern, and selectively etching and removing the photocatalytic compound remaining on the transparent substrate using a buffered oxide etchant (BOE). According to the method, a high-transmittance, high-resolution and low-resistivity optical filter can be manufactured in a simple manner at low costs.


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