The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Nov. 15, 2004
Jae-chang Jung, Seoul, KR;
Cheol-kyu Bok, Icheon, KR;
Seung Chan Moon, Kyunggi-Do, KR;
Ki-soo Shin, Kyunggi-Do, KR;
Jae-chang Jung, Seoul, KR;
Cheol-Kyu Bok, Icheon, KR;
Seung Chan Moon, Kyunggi-Do, KR;
Ki-Soo Shin, Kyunggi-Do, KR;
Hynix Semiconductor Inc., Kyungki-do, KR;
Abstract
A cross-linking polymer for an organic anti-reflective coating that is able to improve the uniformity of an ultra-fine photoresist pattern formed using a photolithography process and an ArF light source with 194 nm wavelength. Organic anti-reflective coatings including the same and a method for forming a photoresist pattern using the same are also disclosed. The disclosed cross-linking polymer is capable of preventing scattered reflection from a bottom film layer, eliminating standing wave effect due to alteration of thickness of the photoresist film, and increasing uniformity of the thickness of photoresist pattern. At the same time, the disclosed cross-linking pattern increases the etching velocity of the organic anti-reflective coating so that it can be easily removed.