The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2007

Filed:

Dec. 31, 2002
Applicant:

Patrick D. Boyd, Aloha, OR (US);

Inventor:

Patrick D. Boyd, Aloha, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention describes a method of providing a substrate, the substrate being transparent to radiation at an actinic wavelength; forming an absorber layer over the substrate, the absorber layer including an active area and a peripheral area; removing the absorber layer from a portion of the peripheral area; and forming a trench in the substrate in the portion of the peripheral area. The present invention further describes a mask including an active area; and a peripheral area located around the active area, the peripheral area including vent channels.


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