The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Mar. 30, 2004
Kaori Misawa, Ibaraki, JP;
Isao Matsumoto, Kyoto, JP;
Naofumi Ohashi, Tokyo, JP;
Koichi Abe, Ibaraki, JP;
Haruaki Sakurai, Ibaraki, JP;
Kaori Misawa, Ibaraki, JP;
Isao Matsumoto, Kyoto, JP;
Naofumi Ohashi, Tokyo, JP;
Koichi Abe, Ibaraki, JP;
Haruaki Sakurai, Ibaraki, JP;
Sanyo Electric Co., Ltd., Morigughi-Shi, Osaka, JP;
Abstract
After applying a film-forming composition containing a polysiloxane, a pore-forming agent, an onium salt, and a solvent onto a semiconductor substrate, the solvent is evaporated from the film-forming composition in a first heat treatment. Then, a second heat treatment is carried out in an inert-gas atmosphere to promote the polymerization of the polysiloxane and thus form a polysiloxane resin film. Thereafter, a third heat treatment is carried out in an oxidizing-gas ambient to form pores in the polysiloxane resin film.