The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2007
Filed:
Dec. 21, 1999
Juergen Rolf Mueller, Hamburg, DE;
Karsten Henco, Dusseldorf, DE;
Rodney Turner, San Francisco, CA (US);
Peter Axhausen, Destedt, DE;
Rolf Guenther, Hamburg, DE;
Juergen Rolf Mueller, Hamburg, DE;
Karsten Henco, Dusseldorf, DE;
Rodney Turner, San Francisco, CA (US);
Peter Axhausen, Destedt, DE;
Rolf Guenther, Hamburg, DE;
Evotec Biosystems AG, Hamburg, DE;
Abstract
The invention relates to a method for optically detecting at least one entity which is arranged on a substrate. The at least one entity is scanned with a measuring volume using at least one radiation source and a confocal optic. During a scanning process an auxiliary focus is generated by means of at least one second radiation source and a second optic. Radiation generated by the first radiation source is collimated by a first optic and radiation generated by the second radiation source is collimated by a second optic. A retroreflection from the auxiliary focus is detected by at least one detector and is used to measuring the position of an interface and, thus, for indirectly positioning the measuring volume. The position of the auxiliary focus relative to the measuring volume is adjustable in a defined manner.