The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2007
Filed:
Apr. 28, 2005
Masaaki Miyaji, Mie, JP;
Tomoki Nagai, Mie, JP;
Yuji Yada, Mie, JP;
Jun Numata, Mie, JP;
Yukio Nishimura, Mie, JP;
Masafumi Yamamoto, Mie, JP;
Hiroyuki Ishii, Mie, JP;
Toru Kajita, Mie, JP;
Tsutomu Shimokawa, Mie, JP;
Masaaki Miyaji, Mie, JP;
Tomoki Nagai, Mie, JP;
Yuji Yada, Mie, JP;
Jun Numata, Mie, JP;
Yukio Nishimura, Mie, JP;
Masafumi Yamamoto, Mie, JP;
Hiroyuki Ishii, Mie, JP;
Toru Kajita, Mie, JP;
Tsutomu Shimokawa, Mie, JP;
JSR Corporation, Tokyo, JP;
Abstract
A chemically amplified radiation-sensitive resin composition comprising a specific copolymer and a photoacid generator, wherein the copolymer contains the following recurring unit (1) and/or the recurring unit (2), and the recurring unit (3-1), wherein Ris a hydrogen or methyl, Ris a Ctertiary alkyl, Rand Rare a hydrogen, Calkyl, Caromatic, Calkoxyl, or Rand Rmay form, in combination and together with the nitrogen atom with which the Rand Rgroups bond, a Ccyclic structure, provided that Rand Rare not a hydrogen atom at the same time. The composition effectively responds to various radiations, exhibits excellent resolution and pattern configuration and minimal iso-dense bias, and can form fine patterns at a high precision and in a stable manner.