The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2007
Filed:
Dec. 12, 2003
Eun-taek Yim, Gyeonggi-do, KR;
Young-wook Park, Gyeonggi-do, KR;
In-sung Park, Seoul, KR;
Han-mei Choi, Seoul, KR;
Kyoung-seok Kim, Seoul, KR;
Eun-Taek Yim, Gyeonggi-do, KR;
Young-Wook Park, Gyeonggi-do, KR;
In-Sung Park, Seoul, KR;
Han-Mei Choi, Seoul, KR;
Kyoung-Seok Kim, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-do, KR;
Abstract
Disclosed are a method for cleaning a deposition chamber by removing attached metal oxides, and a deposition apparatus for performing in situ cleaning. A first gas and a second gas are provided into the deposition chamber. The first gas is reacted with metal included in the metal oxide to generate reacting residues. The second gas then decomposes the reacting residues, and the decomposed residues are exhausted out of the chamber. Thus, this cleaning process can be rapidly accomplished while the deposition chamber is not opened or separated from a deposition apparatus.