The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2007

Filed:

May. 23, 2003
Applicants:

Sylvain Cruchon-dupeyrat, Chicago, IL (US);

Michael Nelson, Libertyville, IL (US);

Jeff Rendlen, Chicago, IL (US);

Joseph Fragala, San Jose, CA (US);

Inventors:

Sylvain Cruchon-Dupeyrat, Chicago, IL (US);

Michael Nelson, Libertyville, IL (US);

Jeff Rendlen, Chicago, IL (US);

Joseph Fragala, San Jose, CA (US);

Assignee:

NanoInk, Inc., Chicago, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 1/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a nanolithographic protosubstrate adapted for nanolithographic formation of nanostructures on the protosubstrate comprising: a substrate having a top surface exposed for nanolithographic formation of nanostructures, wherein the top surface comprises: electrically insulating surface regions; and at least one discreet electrode topology surrounded by the electrically insulating surface regions, wherein the electrode topology is adapted with electrical interconnections for electrically coupling the electrode topology to an external device.


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