The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2007
Filed:
Oct. 26, 2004
Yi-fang Cheng, Jhudong Township, Hsinchu County, TW;
Shan-jen Yu, Longtan Township, Taoyuan County, TW;
Cheng-kweng Chen, Taipei, TW;
Yu-ming Huang, Fongyuan, TW;
Yi-Fang Cheng, Jhudong Township, Hsinchu County, TW;
Shan-Jen Yu, Longtan Township, Taoyuan County, TW;
Cheng-Kweng Chen, Taipei, TW;
Yu-Ming Huang, Fongyuan, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method for removing polymer as an etching residue is described. A substrate with polymer as an etching residue thereon is provided, and a hydrogen-containing plasma is used to treat the substrate. A wet clean step is then performed to remove the polymer from the substrate. The treatment using hydrogen-containing plasma can change the chemical property of the polymer, so that the polymer can be removed more easily in the subsequent wet clean step.