The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2007
Filed:
Nov. 14, 2003
Jeffrey T. Wetzel, Austin, TX (US);
David C. Wang, Austin, TX (US);
Eric M. Lee, Austin, TX (US);
Dorel Ioan Toma, Dripping Springs, TX (US);
Jeffrey T. Wetzel, Austin, TX (US);
David C. Wang, Austin, TX (US);
Eric M. Lee, Austin, TX (US);
Dorel Ioan Toma, Dripping Springs, TX (US);
Tokyo Electron Ltd., Tokyo, JP;
Abstract
An interconnect structure in back end of line (BEOL) applications comprising a tunable etch resistant anti-reflective (TERA) coating is described. The TERA coating can, for example, be incorporated within a single damascene structure, or a dual damascene structure. The TERA coating can serve as part of a lithographic mask for forming the interconnect structure, or it may serve as a hard mask, a chemical mechanical polishing (CMP) stop layer, or a sacrificial layer during CMP.