The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Mar. 23, 2004
Applicant:
Abaneshwar Prasad, Naperville, IL (US);
Inventor:
Abaneshwar Prasad, Naperville, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention provides a polishing pad comprising a polymeric material having pores and a component that is disposed within the pores, as well as a method of polishing a workpiece with the aforesaid polishing pad, and a method for producing the aforesaid polishing pad.
Prasad, Abaneshwar. (2007). Cmp porous pad with component-filled pores (U.S. Patent No. 7195544). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7195544
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile