The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Feb. 17, 2004
Applicants:
Cherng-chyi Han, San Jose, CA (US);
Mao-min Chen, San Jose, CA (US);
Lei Zhang, San Jose, CA (US);
Xiaomin Liu, Milpitas, CA (US);
Inventors:
Cherng-Chyi Han, San Jose, CA (US);
Mao-Min Chen, San Jose, CA (US);
Lei Zhang, San Jose, CA (US);
Xiaomin Liu, Milpitas, CA (US);
Assignee:
Headway Technologies, Inc., Milpitas, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01); H04R 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
For high track density recording, tighter reader and writer track width control are essential. This has been achieved by using a plated NiPd write gap which is self-aligned with a plated 23 KG pole material. Heat dissipation by the writer is thus improved since alumina has been replaced with nonmagnetic metal materials, such as Ru, leading to less pole tip protrusion which in turn leads to better writer track width control