The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Dec. 30, 2003
Martinus Godefridus Helena Boogaarts, Sint Michielsgestel, NL;
Hans Butler, Best, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Martinus Agnes Willem Cuijpers, Veldhoven, NL;
Jan Jaap Kuit, Veldhoven, NL;
Martinus Godefridus Helena Boogaarts, Sint Michielsgestel, NL;
Hans Butler, Best, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Martinus Agnes Willem Cuijpers, Veldhoven, NL;
Jan Jaap Kuit, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is presented, which includes a housing, which comprises therein a first exposure system that has at least one movable part (e.g. a movable first substrate holder or a movable second substrate holder in a twin stage apparatus). The apparatus also includes a position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. A related device manufacturing method is also presented in which, during the exposure of a first substrate, the position thereof is corrected by means of position disturbance correction system.