The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Feb. 03, 2000
Ahmad Ghaemmaghami, Gilroy, CA (US);
Zoran Krivokapic, Santa Clara, CA (US);
Brian Swanson, San Jose, CA (US);
Ahmad Ghaemmaghami, Gilroy, CA (US);
Zoran Krivokapic, Santa Clara, CA (US);
Brian Swanson, San Jose, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method and system for providing a halo implant to a semiconductor device is disclosed. The method and system includes providing a thin photoresist layer that covers a substantial amount of an active area including a source region and a drain region of the semiconductor device. The method and system further includes providing the halo implant to the semiconductor device, using the thin photoresist layer as a mask. Utilizing this thin photoresist layer, taking into account other height variables, the source and drain regions can be opened only as needed. At a 45° angle, the implant can be delivered to all transistors in the circuit in the targeted area as well as getting only a large amount of the dose (up to ¾ of the dose) to the transistor edge which sits on the trench edge.