The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2007
Filed:
Dec. 21, 2004
Applicants:
Hsien H. Chen, Troy, MI (US);
Edward J. Bedner, Brighton, MI (US);
Aleksander B. Hac, Dayton, OH (US);
Inventors:
Hsien H. Chen, Troy, MI (US);
Edward J. Bedner, Brighton, MI (US);
Aleksander B. Hac, Dayton, OH (US);
Assignee:
Delphi Technologies, Inc., Troy, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A control system manages yaw-plane motion, while simultaneously comprehending and managing roll motion. The system reduces excessive maneuver-induced roll motion by properly shaping yaw-plane motion, which may include increasing yaw damping and/or decreasing a yaw gain, under various conditions, to avoid excessive excitation of roll dynamics.