The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2007
Filed:
Dec. 19, 2001
Tony P. Chiang, Santa Clara, CA (US);
Karl F. Leeser, Sunnyvale, CA (US);
Jeffrey A. Brown, San Francisco, CA (US);
Jason E. Babcoke, Menlo Park, CA (US);
Tony P. Chiang, Santa Clara, CA (US);
Karl F. Leeser, Sunnyvale, CA (US);
Jeffrey A. Brown, San Francisco, CA (US);
Jason E. Babcoke, Menlo Park, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
A deposition system includes a process chamber for conducting an ALD process to deposit layers on a substrate. In one embodiment, instead of varying the gas flux on a substrate in the chamber by controlling the flow of gas upstream of the process chamber, the gas flux on the substrate is controlled by controlling the conductance between the process chamber and a lower pressure volume outside the process chamber. The flux of the gas on the substrate varies inversely with the chamber conductance, such that the flux of the gas on the substrate increases when the conductance decreases. Various methods of performing an ALD process by controlling the conductance are disclosed as well as various structures for controlling the conductance.