The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Jan. 26, 2004
Nobuo Ishii, Hyogo, JP;
Kibatsu Shinohara, Kanagawa, JP;
Nobuo Ishii, Hyogo, JP;
Kibatsu Shinohara, Kanagawa, JP;
Tokyo Electron Limited, Tokyo, JP;
Nihon Koshuha Co., Ltd., Kanagawa, JP;
Abstract
A plasma processor includes a table on which a target object is to be placed, a vessel which accommodates the table and in which a plasma is to be generated by a high-frequency electromagnetic field, a high-frequency oscillator () which generates a high-frequency electromagnetic field, and a reference oscillator () which is lower in output power than the high-frequency oscillator () and stable in oscillation frequency. A reference signal generated by the reference oscillator () is injected into the high-frequency oscillator () to fix an oscillation frequency of the high-frequency oscillator () at a frequency of a reference signal. Therefore, accurate load matching is performed to improve an energy efficiency when an automatic matching device provided between the high-frequency oscillator () and vessel is designed based on the frequency of the reference signal.