The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Apr. 19, 2006
Applicants:
Jeonghoon OH, Sunnyvale, CA (US);
Hung Chih Chen, Sunnyvale, CA (US);
Thomas B. Brezoczky, San Jose, CA (US);
Douglas R. Mcallister, Pleasanton, CA (US);
David Datong Huo, Campell, CA (US);
Inventors:
Jeonghoon Oh, Sunnyvale, CA (US);
Hung Chih Chen, Sunnyvale, CA (US);
Thomas B. Brezoczky, San Jose, CA (US);
Douglas R. McAllister, Pleasanton, CA (US);
David Datong Huo, Campell, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 29/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A two part retaining ring is described that has a lower ring and an upper ring. The lower ring contacts a polishing surface during chemical mechanical polishing. The upper surface and the lower surface of the lower ring have matching grooves formed therein to increase the flexibility of the lower ring.