The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
May. 18, 2005
William Roberts, Mechanicsville, VA (US);
Christopher Gould, Quinton, MD (US);
Nicholas Louka, Richmond, VA (US);
William Roberts, Mechanicsville, VA (US);
Christopher Gould, Quinton, MD (US);
Nicholas Louka, Richmond, VA (US);
Infineon Technologies Richmond, LP, Sandston, VA (US);
Abstract
A method of controlling lithographic overlay offsets in the manufacture of semiconductor devices from wafers, comprising the steps of forming a lithographic pattern on a wafer layer with a lithographic tool, processing the wafer after the pattern is formed to enable fabrication of a semiconductor device, predicting overlay offset corrections based on one or more factors involved in the processing of the wafer, and utilizing the predicted overlay offset corrections to positionally control the lithographic tool.