The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7184128 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 27, 2007

Filed:

Jun. 25, 2004
Applicants:

Henricus Gerardus Tegenbosch, Eindhoven, NL;

Sebastiaan Maria Johannes Cornelissen, Eindhoven, NL;

Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract

A lithographic apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation, a support surface having an edge, and a support structure for supporting an object to be moved across the beam of radiation. The support structure is moveably supported on the support surface. The apparatus also includes a rim that is associated with the support surface. The support structure and the rim are configured to allow the support structure to move in a first direction toward the rim and collide with the rim. A total force generated by the collision on the support structure is at least partially directed away from a second direction that is opposite to the first direction.


Find Patent Forward Citations

Tegenbosch, Henricus. (2007). Lithographic apparatus and device manufacturing method (U.S. Patent No. 7184128). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7184128

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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