The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2007

Filed:

Jun. 01, 2004
Applicants:

Andreea Iuliana Rotariu, Sydney, AU;

Rogier Ellenbroek, Den Haag, NL;

Maarten Steinbuch, Helmond, NL;

Gregor Edward Van Baars, Eindhoven, NL;

Inventors:

Andreea Iuliana Rotariu, Sydney, AU;

Rogier Ellenbroek, Den Haag, NL;

Maarten Steinbuch, Helmond, NL;

Gregor Edward Van Baars, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 13/02 (2006.01); G05B 19/18 (2006.01); G05B 13/04 (2006.01); G05B 1/06 (2006.01); G05B 11/00 (2006.01); G06F 19/00 (2006.01); G06F 15/18 (2006.01); G06G 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

By applying time-frequency analysis to a given standard iterative learning control or ILC an adaptive filter for the learned feed-forward loop is designed. This time varying filter varies according to the momentary frequency content of the error signal and allows to discriminate between areas of deterministic and stochastic error. Its application results in selective application of ILC to those intervals where error signals of high level are concentrated and allows application of a single ILC acquisition to different setpoint trajectories. The adaptive filter finds particular use in lithographic scanning systems where it is used for varying scan length.


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