The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2007

Filed:

Jun. 28, 2004
Applicants:

Henry A. Hill, Tucson, AZ (US);

Michael Schroeder, East Hampton, CT (US);

Andrew Eric Carlson, Higganum, CT (US);

Inventors:

Henry A. Hill, Tucson, AZ (US);

Michael Schroeder, East Hampton, CT (US);

Andrew Eric Carlson, Higganum, CT (US);

Assignee:

Zygo Corporation, Middlefield, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

In general, in one aspect, the invention features an interferometer assembly for use in a lithography tool used for fabricating integrated circuits on a wafer, wherein the lithography tool includes a support structure and a stage for positioning the wafer relative to the support structure, the interferometer assembly including an interferometer configured to direct a measurement beam between the stage and the support structure and combine the measurement beam with another beam to form an output beam which includes a phase related to a position of the stage relative to the support structure, wherein the interferometer is mechanically secured to the lithography tool through an interferometer surface selected to cause the phase of the output beam to be insensitive to thermal changes of the interferometer over a range of temperatures.


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