The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
Feb. 28, 2005
Applicants:
Fumihiro Sasajima, Hitachinaka, JP;
Yoshihiro Kimura, Hitachinaka, JP;
Osamu Komuro, Hitachinaka, JP;
Inventors:
Fumihiro Sasajima, Hitachinaka, JP;
Yoshihiro Kimura, Hitachinaka, JP;
Osamu Komuro, Hitachinaka, JP;
Assignee:
Hitachi High-Technologies Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/49 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.