The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2007
Filed:
Feb. 07, 2005
Applicants:
Romeo I. Mercado, Fremont, CA (US);
Shiyu Zhang, Hayward, CA (US);
Inventors:
Romeo I. Mercado, Fremont, CA (US);
Shiyu Zhang, Hayward, CA (US);
Assignee:
Ultratech, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); G02B 9/34 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
A 1× projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens group having first and second prisms and four lenses having a positive-negative-positive negative arrangement as arranged in order from the prisms toward the mirror. A projection photolithography system that employs the projection optical system of the invention is also disclosed.