The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2007
Filed:
Dec. 28, 2004
Roberto B. Wiener, Bethel, CT (US);
Alexander Kremer, Stamford, CT (US);
Elizabeth Stone, Stamford, CT (US);
Richard Zimmerman, Brookfield, CT (US);
Roberto B. Wiener, Bethel, CT (US);
Alexander Kremer, Stamford, CT (US);
Elizabeth Stone, Stamford, CT (US);
Richard Zimmerman, Brookfield, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
A system and method for uniformity correction such that a defined uniformity specification is met while minimizing a set of selected constraints is provided. The system includes illumination optics, an opto-mechanical correction system, a contrast device, projection optics and a correction module coupled to the correction system. The correction system includes a plurality of adjustable components such as fingers. The correction module is configured to determine adjustments to the components to correct uniformity. A method for discretizing the continuous intensity integral is also provided. The illumination slot is divided into a grid having multiple grid points. 'pupils' are then superimposed onto the grid. Multiple second grids are also defined. Each '“pupil'” is mapped to a second grid such that the center of the second grid is coincident with the ““pupil”” center. The continuous intensity integral is then discretized using the first grid, plurality of second grids, and ““pupil”” mappings.