The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2007
Filed:
Sep. 20, 2005
Anastasius Jacobus Anicetus Bruinsma, Delft, NL;
Pieter Johannes Marius Van Groos, Geldrop, NL;
Jan Frederick Hoogkamp, Breda, NL;
Kees Moddemeijer, Leiden, NL;
Folkert Draaisma, Delft, NL;
Anastasius Jacobus Anicetus Bruinsma, Delft, NL;
Pieter Johannes Marius Van Groos, Geldrop, NL;
Jan Frederick Hoogkamp, Breda, NL;
Kees Moddemeijer, Leiden, NL;
Folkert Draaisma, Delft, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus transfers a pattern from a patterning device onto a substrate and includes a projection system to project a patterned radiation beam onto the substrate; a controllable actuator to adjust a distance between the projection system and the substrate; and a particle detector system to detect a particle on a surface of the substrate. The particle detector system has illumination optics directing the radiation to a detection area of the surface of the substrate, detection optics receiving radiation from the detection area of the surface of the substrate, and a detector coupled to the detection optics to produce a measurement signal. The apparatus further has a processing system to determine the height of a particle from the measurement signal, generate a height excess signal if the height exceeds a threshold value, and control the actuator in response to the height excess signal.