The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2007
Filed:
Aug. 06, 2003
Mitsumi Ito, Nagaokakyo, JP;
Junichi Shimada, Osaka, JP;
Kiyohito Mukai, Takatsuki, JP;
Hiroyuki Tsujikawa, Kusatsu, JP;
Mitsumi Ito, Nagaokakyo, JP;
Junichi Shimada, Osaka, JP;
Kiyohito Mukai, Takatsuki, JP;
Hiroyuki Tsujikawa, Kusatsu, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
To provide a pattern generating method for a semiconductor device capable of forming a highly reliable semiconductor device, the accuracy of which is high. A method of generating a pattern for a semiconductor device comprises: a step of designing and arranging a layout pattern of a semiconductor chip; a step of extracting an area ratio of the mask pattern from the layout pattern; and a step of adding and arranging a dummy pattern to the layout pattern, while consideration is given to the most appropriate area ratio of the layout pattern of the layer obtained according to a process condition of the layer composing the layout pattern, so that the area ratio of the layer can be the most appropriate area ratio.