The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2007
Filed:
Mar. 25, 2004
Chien-chou Hung, Huatan Township, Changhua County, TW;
Hua-chou Tseng, Hsinchu, TW;
Tsun-lai Hsu, Hsinchu Hsien, TW;
Cheng-wen Fan, Hsinchu Hsien, TW;
Chia-hung Chin, Taipei, TW;
Ellis Lin, Taipei, TW;
Chien-Chou Hung, Huatan Township, Changhua County, TW;
Hua-Chou Tseng, Hsinchu, TW;
Tsun-Lai Hsu, Hsinchu Hsien, TW;
Cheng-Wen Fan, Hsinchu Hsien, TW;
Chia-Hung Chin, Taipei, TW;
Ellis Lin, Taipei, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
An inductor formed on a substrate having a dielectric layer thereon is disclosed. The inductor includes a first inductor pattern, a second inductor pattern a third inductor pattern. The first inductor pattern is formed within the dielectric layer, the second inductor pattern is formed on the first inductor pattern and electrically connected thereto, and the third inductor pattern is formed on the second inductor pattern and electrically connected thereto, wherein the first inductor pattern, the second inductor pattern, and the third inductor pattern have similar pattern. Because the thickness of the inductor can be increased by forming a multi-layer inductor structure, the resistance of the inductor, therefore, is reduced.