The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2007
Filed:
Nov. 15, 2004
Applicants:
Fuad Badrieh, Santa Clara, CA (US);
Feng Dai, San Jose, CA (US);
Bartosz Banachowicz, Santa Clara, CA (US);
Roger J. Bettman, Los Altos, CA (US);
Inventors:
Fuad Badrieh, Santa Clara, CA (US);
Feng Dai, San Jose, CA (US);
Bartosz Banachowicz, Santa Clara, CA (US);
Roger J. Bettman, Los Altos, CA (US);
Assignee:
Cypress Semiconductor Corporation, San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/425 (2006.01);
U.S. Cl.
CPC ...
Abstract
In one embodiment, an electrically conductive trench in an integrated circuit allows for the formation of capacitors between the trench and other portions of the integrated circuit. For example, a capacitor may be formed between the trench and an electrically conductive line. Among other advantages, the capacitor provides a relatively large capacitance while occupying a relatively small area.