The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Aug. 19, 2003
Igor Rozhanskii, Tokyo, JP;
Masayuki Takahashi, Tokyo, JP;
Kohei Goto, Tokyo, JP;
Yousuke Konno, Tokyo, JP;
Toshihiro Ohtsuki, Tokyo, JP;
Yoshitaka Yamakawa, Tokyo, JP;
Toshiaki Kadota, Tokyo, JP;
Igor Rozhanskii, Tokyo, JP;
Masayuki Takahashi, Tokyo, JP;
Kohei Goto, Tokyo, JP;
Yousuke Konno, Tokyo, JP;
Toshihiro Ohtsuki, Tokyo, JP;
Yoshitaka Yamakawa, Tokyo, JP;
Toshiaki Kadota, Tokyo, JP;
JSR Corporation, Tokyo, JP;
Abstract
Disclosed is an aromatic sulfonic acid ester derivative represented by the formula (1); in the formula, X is an atom or a group selected from a halogen atom excluding fluorine, —OSOCHand —OSOCF, A is a divalent electron attractive group, B is a divalent electron donating group or a direct bonding, Ris a hydrocarbon group of 1 to 20 carbon atoms, Ar is an aromatic group having a substituent of —SOR(wherein Ris a hydrocarbon group of 1 to 20 carbon atoms), m is an integer of 0 to 10, n is an integer of 0 to 10 and k is an integer of 1 to 4. Also disclosed is a process for producing a polyarylene having a sulfonic acid group, which process comprises the steps of coupling polymerization of an aromatic compound containing the derivative of the formula (1), to prepare a polyarylene and hydrolysis of the polyarylene, and which process has high safety and is easily capable of controlling the amount of sulfonoc acid group introduced into a polymer and the introducing position thereof.