The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Nov. 01, 2004
Frank Weber, Austin, TX (US);
Frank Weber, Austin, TX (US);
Infineon Technologies AG, Munich, DE;
Abstract
In preferred embodiments, a polydentate pore-sealing ligand is used to seal or repair pores damaged by plasma processing. The polydentate ligand includes bidentate ligands corresponding to the general formula X—CH—(CH)—CH—X or X—Si(CH)—(CH)—Si(CH)—X. The polydentate ligand also includes tridendate ligands corresponding to the general formula X—CH—(CH)(CXH)(CH)—CH—X or X—Si(CH)—(CH)(CXH)(CH)—Si(CH)—X. Alternative embodiments may include single or multiply branched polydentate ligands. Other embodiments include ligands that are cross-linked after attachment to the dielectric. Still other embodiments include a derivatization reaction wherein silanol groups formed by plasma damage are removed and favorable dielectric properties are restored.