The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2007
Filed:
Nov. 22, 2004
Kathy A. Gehoski, Gilbert, AZ (US);
William J. Dauksher, Mesa, AZ (US);
Ngoc V. Le, Gilbert, AZ (US);
Douglas J. Resnick, Gilbert, AZ (US);
Kathy A. Gehoski, Gilbert, AZ (US);
William J. Dauksher, Mesa, AZ (US);
Ngoc V. Le, Gilbert, AZ (US);
Douglas J. Resnick, Gilbert, AZ (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A direct imprinting process for Step and Flash Imprint Lithography includes providing () a substrate (); forming () an etch barrier layer () on the substrate; patterning () the etch barrier layer with a template () while curing with ultraviolet light through the template, resulting in a patterned etch barrier layer and a residual layer () on the substrate; and performing () an etch to substantially remove the residual layer. Optionally, a patterning layer () may be formed on the substrate () prior to forming the etch barrier layer (). Additionally, an adhesive layer () may be applied () between the substrate () and the etch barrier layer ().