The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2007

Filed:

Oct. 28, 2004
Applicants:

Kurt Ulmer, Corvallis, OR (US);

Jian-gang Weng, Corvallis, OR (US);

Peter Mardilovich, Corvallis, OR (US);

John Christopher Rudin, Bristol, GB;

Inventors:

Kurt Ulmer, Corvallis, OR (US);

Jian-gang Weng, Corvallis, OR (US);

Peter Mardilovich, Corvallis, OR (US);

John Christopher Rudin, Bristol, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 31/232 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for forming a metal-insulator-metal device includes imprinting at least one first layer to form a first impression, removing a portion of at least one second layer through the first depression to form a recess in the at least one second layer bordered by a first side, a first overhang along the first side, a second opposite side and a second overhang along the second side. The method also includes depositing a first metal in the recess spaced from the first side and the second side and oxidizing the first metal to create a non-linear dielectric.


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