The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 09, 2007

Filed:

Feb. 20, 2002
Applicants:

Markus Kostrzewa, Borsdorf-Panitzsch, DE;

Thomas Fröhlich, Leipzig, DE;

Thomas Wenzel, Leipzig, DE;

Andres Jäschke, Berlin, DE;

Felix Hausch, Stanford, CA (US);

Inventors:

Markus Kostrzewa, Borsdorf-Panitzsch, DE;

Thomas Fröhlich, Leipzig, DE;

Thomas Wenzel, Leipzig, DE;

Andres Jäschke, Berlin, DE;

Felix Hausch, Stanford, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12Q 1/68 (2006.01); C12P 19/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method of a mass-spectrometric analysis of known mutation sites in the genome, such as single nucleotide polymorphisms (SNPs), using the method of restricted primer extension. The invention consists of the use of primers with a photocleavable linker. The linker creates a gap in a DNA strand which is almost the same size as a natural DNA building block (nucleoside). The linker forms a bridge over a base pair without inhibiting hybridization or enzymatic extension. However, the linker allows the primers to be cleaved after extension in order to obtain short DNA fragments which can be more easily detected on the mass spectrometer.


Find Patent Forward Citations

Loading…