The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Jan. 13, 2003
Peter Porshnev, San Jose, CA (US);
Sebastien Raoux, Cupertino, CA (US);
Mike Woolston, San Jose, CA (US);
Christopher L. Aardahl, Richland, WA (US);
Rick J. Orth, Kennewick, WA (US);
Kenneth G. Rappe, Richland, WA (US);
Peter Porshnev, San Jose, CA (US);
Sebastien Raoux, Cupertino, CA (US);
Mike Woolston, San Jose, CA (US);
Christopher L. Aardahl, Richland, WA (US);
Rick J. Orth, Kennewick, WA (US);
Kenneth G. Rappe, Richland, WA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A substrate processing apparatus has a process chamber and an effluent treatment reactor. The process chamber has a substrate support, a process gas supply, a gas energizer, and an exhaust conduit. The effluent treatment reactor has an effluent inlet to receive effluent from the exhaust conduit of the process chamber, a plasma cell having one or more electrodes electrically connected to a voltage source adapted to electrically bias the electrodes to couple energy to effluent received in the plasma cell, a scrubbing cell coaxially exterior to the plasma cell, the scrubbing cell having a scrubbing fluid inlet to introduce scrubbing fluid into effluent in the scrubbing cell and a scrubbing fluid outlet, and an effluent outlet to release the treated effluent.