The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Aug. 17, 2001
Koji Matsuo, Kubiki-mura, JP;
Hisatoshi Otsuka, Kubiki-mura, JP;
Kazuo Shirota, Kubiki-mura, JP;
Shigeru Maida, Kubiki-mura, JP;
Koji Matsuo, Kubiki-mura, JP;
Hisatoshi Otsuka, Kubiki-mura, JP;
Kazuo Shirota, Kubiki-mura, JP;
Shigeru Maida, Kubiki-mura, JP;
Shin-Etsu Chemical Co, Ltd., Tokyo, JP;
Abstract
Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90–120° so that the porous silica matrix has a density of 0.1–1.0 g/cmwith a narrow distribution within 0.1 g/cm. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.