The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2007
Filed:
Jun. 07, 2005
Ravichandra V. Palaparthi, Newark, DE (US);
Ravichandra V. Palaparthi, Newark, DE (US);
Rohm and Haas Electronic Materials CMP Holdings, Inc., Wilmington, DE (US);
Abstract
A polishing pad () for polishing a wafer () or other article, the pad having a groove network () configured to vary the residence time across the wafer track of the reaction products formed by the interaction of reactants in the polishing medium () with structure on the wafer. The groove network has a first portion () that may extend substantially radially outward and a second portion () that is configured to vary the speed of the radially outward flow of the polishing medium.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile