The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2006
Filed:
Aug. 28, 2003
Kun LI, Milpitas, CA (US);
Mark A. Erickson, Sacramento, CA (US);
Ioannis Kanellakopoulos, Cupertino, CA (US);
Kun Li, Milpitas, CA (US);
Mark A. Erickson, Sacramento, CA (US);
Ioannis Kanellakopoulos, Cupertino, CA (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method and system are disclosed for creating dynamic models of etch processes in semiconductor manufacturing. In one embodiment, a method comprises modeling an etch process used in semiconductor manufacturing to generate a dynamic process model. The dynamic process model is used to determine input values that result in a desired output value. A process recipe is optimized for the etch process with the input values.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile