The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2006
Filed:
Feb. 25, 2005
Hae-sung Kim, Geonggi-do, KR;
Myung-bok Lee, Gyeonggi-do, KR;
Jin-seung Sohn, Seoul, KR;
Mee-suk Jung, Gyeonggi-do, KR;
Eun-hyoung Cho, Seoul, KR;
Hae-sung Kim, Geonggi-do, KR;
Myung-bok Lee, Gyeonggi-do, KR;
Jin-seung Sohn, Seoul, KR;
Mee-suk Jung, Gyeonggi-do, KR;
Eun-hyoung Cho, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
Provided is a method of exposing using an electron beam. The provided method of exposing using the electron beam includes defining main fields on an exposure area of an electron beam exposure target and defining a plurality of sub-fields on the main fields, selecting a main field to be exposed, selecting at least one sub-field of the selected main field, exposing the selected sub-field by using the electron beam, and selecting at least one of the other sub-field, which is not adjacent to the previously selected sub-field and not exposed yet, and exposing the sub-field by using the electron beam.