The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2006
Filed:
Aug. 11, 2000
Masayuki Tomoyasu, Nirasaki, JP;
Masayuki Tomoyasu, Nirasaki, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
There is provided a plasma processing system and method capable of decreasing the non-uniformity of a field distribution on the surface of an electrode and making the density of plasma uniform, in a plasma processing using a high density plasma which can cope with a further scale down. First and second electrodesandare provided in a chamber so as to face each other. A feeder plateis arranged so as to be slightly spaced from the opposite surface of a surface serving as a feeding plane of the first electrode facing the second electrode. A feeder rodis connected to the feeder plateat a position which is radially shifted from a position corresponding to the center of the feeding plane of the first electrode. The feeder plateis rotated to rotate the feeding position of the feeder rodon the feeding plane of the first electrode. A high frequency electric power is thus fed to form a high frequency electric field between the first and second electrodesandto form plasma to plasma-process a substrate W.