The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 19, 2006
Filed:
Aug. 04, 2004
Per Askebjer, Akersberga, SE;
Hans Fosshaug, Spanga, SE;
Robert Eklund, Stockholm, SE;
Jonathan Walford, Vallentuna, SE;
Per Askebjer, Akersberga, SE;
Hans Fosshaug, Spanga, SE;
Robert Eklund, Stockholm, SE;
Jonathan Walford, Vallentuna, SE;
Micronic Laser Systems AB, Taby, SE;
Abstract
The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates. Particular writing strategies are described. Aspects of the present invention are described in the claims, specification and drawings.