The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Jul. 01, 2004
Evert Hendrik Jan Draaijer, Eindhoven, NL;
Martinus Agnes Willem Cuijpers, Veldhoven, NL;
Menno Fien, Goirle, NL;
Marcus Joseph Elisabeth Godfried Breukers, Eindhoven, NL;
Martijn Houkes, Sittard, NL;
Edwin Teunis Van Donkelaar, Eindhoven, NL;
Evert Hendrik Jan Draaijer, Eindhoven, NL;
Martinus Agnes Willem Cuijpers, Veldhoven, NL;
Menno Fien, Goirle, NL;
Marcus Joseph Elisabeth Godfried Breukers, Eindhoven, NL;
Martijn Houkes, Sittard, NL;
Edwin Teunis Van Donkelaar, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.