The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Sep. 11, 2003
Applicants:
Franciscus Johannes Herman Maria Teunissen, Rotterdam, NL;
Antonius Johannes Van Der Net, Tilburg, NL;
Willem Lock, Veldhoven, NL;
Inventors:
Franciscus Johannes Herman Maria Teunissen, Rotterdam, NL;
Antonius Johannes Van der Net, Tilburg, NL;
Willem Lock, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a purge gas system for a lithographic apparatus, a rate of flow of purge gas to the system is reduced substantially once a contamination level has fallen below a threshold level. The control may be on the basis of a detected level of contamination or on the basis of a timetable.
Teunissen, Franciscus Johannes Herman Maria. (2006). Lithographic apparatus and device manufacturing method (U.S. Patent No. 7148949). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7148949
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile