The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Apr. 16, 2004
Applicants:
Zhizhang Chen, Corvallis, OR (US);
Ronald L. Enck, Corvallis, OR (US);
Sriram Ramamoorthi, Corvallis, OR (US);
Qin Liu, Corvallis, OR (US);
Inventors:
Zhizhang Chen, Corvallis, OR (US);
Ronald L. Enck, Corvallis, OR (US);
Sriram Ramamoorthi, Corvallis, OR (US);
Qin Liu, Corvallis, OR (US);
Assignee:
Hewlett-Packard Development Company, LP., Houston, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 1/62 (2006.01); H01J 63/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for creating an electron lens includes the steps of applying a polymer layer on an emitter surface of an electron emitter and then curing the polymer layer to reduce volatile content.