The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Dec. 31, 2003
Mark Kroon, Utrecht, NL;
Michael Cornelis Van Beek, Eindhoven, NL;
Peter Dirksen, Valkenswaard, NL;
Ralph Kurt, Eindhoven, NL;
Cassandra May Owen, Chandler, AZ (US);
Mark Kroon, Utrecht, NL;
Michael Cornelis Van Beek, Eindhoven, NL;
Peter Dirksen, Valkenswaard, NL;
Ralph Kurt, Eindhoven, NL;
Cassandra May Owen, Chandler, AZ (US);
ASML Netherlands, B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.