The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2006
Filed:
Apr. 19, 2002
Georg Roters, Dümen, DE;
Roland Mader, Altusried, DE;
Helmut Sommer, Deggingen, DE;
Genrih Erlikh, Daly City, CA (US);
Yehuda Pashut, San Jose, CA (US);
Georg Roters, Dümen, DE;
Roland Mader, Altusried, DE;
Helmut Sommer, Deggingen, DE;
Genrih Erlikh, Daly City, CA (US);
Yehuda Pashut, San Jose, CA (US);
Mattson Thermal Products, , DE;
Abstract
The aim of the invention is the simple and economical production of a hydrogen-rich process gas from water vapour and hydrogen, whereby the proportion of water vapour to hydrogen may be precisely controllable and reproducible. Said aim is achieved, with a method and device for the production of a process gas for the treatment of substrates, in particular semiconductor substrates, in which the oxygen for formation of a process gas, comprising water vapour and hydrogen, is burnt in a hydrogen-rich environment in a combustion chamber.